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Volume 4 Nano Research & Applications
ISSN: 2471-9838
Notes:
JOINT EVENT
October 04-05, 2018 Moscow, Russia
&
2nd Edition of International Conference on
26th International Conference on Advanced Nanotechnology
Materials Technology and Manufacturing Innovations
Advanced Nanotechnology 2018
& Materials-Manufacturing 2018
October 04-05, 2018 Page 14
Mineo Hiramatsu
Meijo University, Japan
Mineo Hiramatsu, Nano Res Appl 2018, Volume 4
DOI: 10.21767/2471-9838-C5-019
Plasma processing for carbon nanostructures
Carbon nanostructures, namely, graphene-based materials such as carbon nanotube and graphene itself have
attracted much attention due to their outstanding properties as well as emerging applications. For the synthesis
of diamond and amorphous carbon films, graphene-based materials can be synthesized by several plasma enhanced
chemical vapor deposition (PECVD) techniques on heated substrates (600-800˚C) employing methane and hydrogen
mixtures. For example, plane graphene formation can be realized by PECVD on Ni substrate in the remote plasma
configuration at relatively low temperatures (~650˚C). In fact, excess flux of carbon precursors causes supersaturation
and ion bombardment induces the nucleation of nanographene, resulting in the formation of vertical nanographene
(carbon nanowall, CNW). CNWs are few-layer graphenes standing vertically on a substrate to form a self-supported
network of wall structures. The maze-like architecture of CNWs with large-surface-area graphene planes would be useful
as electrodes for energy devices, electrochemical and biosensors. Morphology including structure and crystallinity as
well as electrical properties of carbon nanostructures should be controlled according to their applications. Plasma
processing has a significant role in fabricating carbon-based materials and achieving their practical use in many areas.
We report the current status of the synthesis of plane graphene and vertical graphene using PECVD, and focus on the
control of the CNW structures during the growth processes as well as post treatment to be used as platform of the
electrochemical and bio applications.
Biography
Mineo Hiramatsu is a full professor in Department of Electrical and Electronic Engineering and the Director of Research Institute, Meijo University, Japan. He
served as the Director of The Japan Society of Applied Physics. His main fields of research are plasma diagnostics and plasma processing for the synthesis
of thin films and nanostructured materials. He is an Author of more than 100 scientific papers and Member of organizing and scientific committees of inter-
national conferences on plasma chemistry and plasma processing. He is the Fellow of Japan Society of Applied Physics.