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Volume 3, Issue 4 (Suppl)

Nano Res Appl

ISSN: 2471-9838

November 07-08, 2017 Singapore

International Meeting on

Advanced Nanomaterials and Nanotechnology

Nanomaterials Meetings 2017

November 07-08, 2017

Page 22

Ultrahigh responsivity near infrared photo detectors based on single

semiconductor nanowires

I

n this report, we show that ultra-high responsivity (R>105-106A/Watts) Near Infra-Red

(NIR) photodetectors can be made from single strand of nanowires of semiconductors

like Si, Ge or molecular materials like Cu:TCNQ. The nanowires used were all grown

by vapor phase methods and the single nanowire devices were fabricated on SiO2/Si

substrate where the electrical leads were made using a combination of optical lithography

and nanolithography tools such as electron beam lithography and lift off or focused ion

beam or focused electron beam deposition methods. The typical device lengths are in

the range of 1-5 microns and then nanowire strands have a diameter <100 nm. The

distance between the electrodes was brought down to below 300 nm. In case of the

molecular material Cu: TCNQ, which gives a narrowband detector, a peak responsivity

of 10

4

-10

5

A/W can be reached at 405nm with nanowire of diameter 30nm. In case of Si

nanowires (diameter ~80-100nm), the response is broad band and a responsivity >10

4

A/W can be reached over the wavelength of 500nm to 1150 nm. For Ge nanowires, the

response can be seen even over broader wavelength region extending well into the NIR

region limited by the band-width of Ge (1850 nm). The peak responsivity in this case

can reach even 10

6

A/W at wavelength range 800 nm-1000 nm. Though not very large

reasonable responsivity, can also be seen from single strands of Y-junction CNT. The

ultra-high sensitivity in single nanowire devices are contributed by a number of factors

that include: (1) very close distance between electrodes, (2) small diameter allowing for

photo-transistor effects at the surface of nanowires and (3) diffusion of photo generated

carriers lowering the Schottky barrier at the contact interface.

Recent Publications

1. KDas, SMukherjee, SManna, S KRay and AKRaychaudhuri (2014) Single Si nanowire

(diameter ≤100 nm) based polarization sensitive near-infrared photodetector with

ultra-high responsivity. RSC Nanoscale; 6: 1123.

2. Sudeshna Samanta, Deepika Saini, Achintya Singha, Kaustuv Das, P R Bandaru, A

M Rao, and A K Raychaudhuri (2016) Photoresponse of a Single Y-Junction Carbon

Nanotube. ACS Applied Materials and Interfaces; 8: 19024.

Biography

A K Raychaudhuri has obtained his MSc from IIT Kanpur and PhD from Cornell University, Ithaca, USA. He had

Post-doctoral experience at the Max Planck Institute, Stuttgart as an Alexander von Humboldt Fellow. He has

worked as a Professor at Indian Institute Science Bangalore, the Director of National Physical Laboratory, New

Delhi and as the Director of S. N. Bose National Centre for Basic Sciences, Kolkata, where he is currently a

Distinguished Professor Emeritus and J C Bose Fellow. His research interests cover condensed matter physics

and materials physics. His current research mainly focuses on nanomaterials that include nanofabrications using

nanolithography techniques such as use of electron-beam and ion-beam lithography for fabrication of single

nanowires based devices including ultra-high responsivity single nanowire photodetectors. He is a Fellow of all the

Science Academies in India and is a winner of the S S Bhatnagar Award in Physical Sciences in 1994.

arup@bose.res.in

A K Raychaudhuri

S. N. Bose National Centre for Basic

Sciences, India

A K Raychaudhuri, Nano Res Appl 2017, 3:4

DOI: 10.21767/2471-9838-C1-004

Proteomics Meeting 2017